Accession Number : ADA119268

Title :   Laser Produced X-Rays for High Resolution Lithography.

Descriptive Note : Interim rept. 15 Dec 81-3 Aug 82,

Corporate Author : BATTELLE COLUMBUS LABS OH

Personal Author(s) : Epstein,Harold M

PDF Url : ADA119268

Report Date : 03 Aug 1982

Pagination or Media Count : 20

Abstract : It has been demonstrated that a relatively small, high repetition rate laser can be a most attractive high average power source of x-rays in the 3/4 to 2 keV range. This x-ray energy range is particularly significant for x-ray microlithography of integrated circuits. Mode locked Nd-YAG lasers focused to several tens of micrometer spot sizes are very efficient x-ray sources for this purpose. Over ten percent of the laser light can be converted to x-rays of energy over 1 keV with a 400 mj 200 psec laser. Mode locked lasers with repetition rates of 10Hz and the above outputs are available now. Applicable laser systems with much higher average power should be available in the near future. (Author)

Descriptors :   *X rays, *Yag lasers, *Neodymium lasers, *Mode locked lasers, *Lithography, Laser beams, Energy conversion, Integrated circuits, High resolution

Subject Categories : Lasers and Masers
      Mfg & Industrial Eng & Control of Product Sys
      Nuclear Physics & Elementary Particle Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE