Accession Number : ADA134706

Title :   Lithography Radiation Effects Study.

Descriptive Note : Interim rept. 20 Nov 80-20 May 82,

Corporate Author : SPIRE CORP BEDFORD MA

Personal Author(s) : Murray,B

PDF Url : ADA134706

Report Date : Sep 1983

Pagination or Media Count : 46

Abstract : An experimental x-ray lithography facility for irradiation thin films of a photoresist next to a gold mask is described. The x-ray irradiance and PMMA irradiation times are estimated for several target elements with characteristics x-ray lines in the 1-3 KeV energy range. Gold masks deposited with films of carbon 100, 220, 520 and 710 Angstroms thick were placed next to films of PBS resist and irradiated with x-rays from Al, Ag, and Ti targets bombarded by 10 KeV electrons. The exposed PBS was etched for a fixed time interval, and the thickness of the etched resist next to the varying film thicknesses of carbon was measured by optical ellipsometry. The plot of etched PBS thickness vs carbon film thickness gave a measure of the depth of penetration of x-ray photoelectrons from the fold mask into the resist and a possible method of measuring dose-depth profiles at material interfaces at soft x-ray energies. (Author)

Descriptors :   *Lithography, *Irradiation, *Thin films, *Photoresistors, Research facilities, X rays, Radiation effects, Measurement, Thickness, Photoelectrons, Etching

Subject Categories : Electrooptical and Optoelectronic Devices
      Test Facilities, Equipment and Methods
      Printing and Graphic Arts

Distribution Statement : APPROVED FOR PUBLIC RELEASE