Accession Number : ADA135991

Title :   Thermal Diffusivity in Thin Films Measured by Noncontact Single-Ended Pulsed-Laser-Induced Thermal Radiometry.

Descriptive Note : Technical rept.,

Corporate Author : IBM RESEARCH LAB SAN JOSE CA

Personal Author(s) : Tam,A C ; Leung,W P

PDF Url : ADA135991

Report Date : 22 Nov 1983

Pagination or Media Count : 21

Abstract : A pulsed nitrogen laser is used to induce a sharp thermal gradient in a thin film, and the thermal radiation (infrared) transient from the irradiated region is monitored from the same side as the excitation beam (ie.e, single-ended detection). We show that this pulsed photothermal radiometry lineshape can be analyzed to provide the thermal diffusivity or thickness of the sample, as well as information on subsurface modifications or the degree of thermal contact with a substrate. We present data for several important classes of films, including metal, polymer and paper (e.g., in currency) and show the important features of the present technique for thin-film characterization, namely nondestructive, fast and remote sensing. (Author)

Descriptors :   *Thermal diffusion, *Thin films, Nondestructive testing, Photothermal properties, Nitrogen lasers, Pulsed lasers, Measurement, Radiometry, Thermal properties, Solid state physics, Reprints

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE