Accession Number : ADA136118

Title :   Characterization of Crystallographic Structure and Internal Stress of Chromium Coatings Plated under Current Interruptions.

Descriptive Note : Final rept.,

Corporate Author : ARMY ARMAMENT RESEARCH AND DEVELOPMENT CENTER WATERVLIET NY LARGE CALIBER WEAPON SYSTEMS LAB

Personal Author(s) : Capsimalis,G P ; Chen,E S

PDF Url : ADA136118

Report Date : Sep 1983

Pagination or Media Count : 23

Abstract : The effect of interrupted current (IC) plating on the visual crack morphology, crystallography, and residual stresses of electrodeposited chromium has been investigated. Varying the process parameters such as the on/off plating cycle and current density resulted in changing the crystallographic fiber texture of the deposit from the conventional 111 orientation to a combination of 211, 111, and a small fraction of randomly oriented crystallites. Under these plating conditions, it was also found that (1) lower amounts of chromium hydride (CrHx) occur in the deposit, (2) a large decrease in the microcrack density of the deposit occurs, and (3) the deposits tend to become compressively stressed.

Descriptors :   *Chromium, *Electrodeposition, *Microstructure, Crystal structure, Residual stress, Microcracking, Electric current, Fabrication, Hardness, Crystallography

Subject Categories : Properties of Metals and Alloys
      Fabrication Metallurgy
      Crystallography
      Mechanics

Distribution Statement : APPROVED FOR PUBLIC RELEASE