Accession Number : ADA136118
Title : Characterization of Crystallographic Structure and Internal Stress of Chromium Coatings Plated under Current Interruptions.
Descriptive Note : Final rept.,
Corporate Author : ARMY ARMAMENT RESEARCH AND DEVELOPMENT CENTER WATERVLIET NY LARGE CALIBER WEAPON SYSTEMS LAB
Personal Author(s) : Capsimalis,G P ; Chen,E S
PDF Url : ADA136118
Report Date : Sep 1983
Pagination or Media Count : 23
Abstract : The effect of interrupted current (IC) plating on the visual crack morphology, crystallography, and residual stresses of electrodeposited chromium has been investigated. Varying the process parameters such as the on/off plating cycle and current density resulted in changing the crystallographic fiber texture of the deposit from the conventional 111 orientation to a combination of 211, 111, and a small fraction of randomly oriented crystallites. Under these plating conditions, it was also found that (1) lower amounts of chromium hydride (CrHx) occur in the deposit, (2) a large decrease in the microcrack density of the deposit occurs, and (3) the deposits tend to become compressively stressed.
Descriptors : *Chromium, *Electrodeposition, *Microstructure, Crystal structure, Residual stress, Microcracking, Electric current, Fabrication, Hardness, Crystallography
Subject Categories : Properties of Metals and Alloys
Distribution Statement : APPROVED FOR PUBLIC RELEASE