Accession Number : ADA137827

Title :   Laser Chemical Vapor Deposition.

Descriptive Note : Final scientific rept.,

Corporate Author : UNIVERSITY OF SOUTHERN CALIFORNIA LOS ANGELES CENTER FOR LASER STUDIES

Personal Author(s) : Allen,S D ; Bass,M

PDF Url : ADA137827

Report Date : 20 Dec 1983

Pagination or Media Count : 84

Abstract : Metal, dielectric and semiconductor films have been deposited by laser chemical vapor deposition (LCVD) using both pulsed and cw laser sources on a variety of substrates. For LCVD on substrates such as quartz, the deposition was monitored optically in both transmission and reflection using a collinear visible laser and the depositing CO2 laser. Deposition initiation and rate were correlated with irradiation conditions, the laser generated surface temperature, and the changing optical properties of the film/substrate during deposition. Single crystallites of W greater than 100 micrometers tall were deposited using a Kr laser on Si substrates. (Author)

Descriptors :   *Laser applications, *Vapor deposition, *Films, Substrates, Quartz, Monitoring, Optics, Transmittance, Reflection, Continuous wave lasers, Visible spectra, Carbon dioxide lasers, Crystals, Krypton, Silicon, Metals, Dielectric films, Semiconducting films, Helium neon lasers

Subject Categories : Lasers and Masers
      Fabrication Metallurgy
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE