Accession Number : ADA141674

Title :   Synthesis and Evaluation of Improved Electron-Beam and X-Ray Lithographic Resist Polymers.

Descriptive Note : Final rept. 1 Jul 79-31 Dec 81,


Personal Author(s) : Pittman,C U , Jr

PDF Url : ADA141674

Report Date : May 1984

Pagination or Media Count : 9

Abstract : It was the goal of this research to investigate the relationship between the chemical structure of polymers and the properties which would result in a new generation of lithographic resists for electron-beam and X-ray lithography. Thus, the synthesis of a variety of vinyl homopolymers, copolymers and terpolymers was undertaken where quaternary centers were present along the polymer backbone. (Author)

Descriptors :   *Synthesis(Chemistry), *Polymers, *Molecular structure, Vinyl plastics, Quaternary compounds, Chemical bonds, Cleavage, Irradiation, Gamma rays, Electron beams, X rays, Lithography, Resistors, Purification, Fractionation, Radiation damage, Sensitivity, Etching, Resistance, Solubility

Subject Categories : Polymer Chemistry

Distribution Statement : APPROVED FOR PUBLIC RELEASE