Accession Number : ADA141813

Title :   Schottky Barrier Photoelectrodes with a Variable Barrier Height.

Descriptive Note : Final rept. 26 Sep 83-25 Mar 84,

Corporate Author : EIC LABS INC NORWOOD MA

Personal Author(s) : Rauh,R D ; Rogers,D R

PDF Url : ADA141813

Report Date : May 1984

Pagination or Media Count : 31

Abstract : The purpose of this research is to investigate the properties of Schottky barriers formed between semiconductors and ion insertion compounds having continuously and reversibly variable work functions. In Phase I, the diode p-Si/M(x)WO3 (M = H, Li) was studied. Li(x)WO3 thin films, prepared by vacuum evaporation or sputtering, showed work functions spanning the range 4.2-5.2 eV for x = 0 to 0.4. Electrical measurements on solid state diodes employing Li(x)WO3 layers revealed a barrier height modulation of 0.06V for this range, limited by significant Fermi level pinning. Photoelectrochemical measurements of H(x)WO3 coated p-Si electrodes showed that the ion insertion compound enhanced electrode stability and photoresponse in acidic electrolytes. The band bending in naked and coated p-Si electrodes was measured as a function of applied bias using a new technique assessing saturation photovoltage as the electrode is polarized. The slope of these curves, (dVB/dV), is related inversely to the interface state density, Ds. Ds was significantly reduced by the H(x)WO3 overlayer. (Author)

Descriptors :   *Barriers, *Schottky barrier devices, *Silicon, *Semiconductors, *Photovoltaic effect, Electrodes, Evaporation, Work functions, Fermi surfaces, Tungstates, Electrical measurement, Vacuum, Electrolytes, Functions, Saturation, Interfaces, Height, Variables, Diodes, Sputtering, Stability, Density, Modulation, Acids, Bias

Subject Categories : Electrical and Electronic Equipment
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE