Accession Number : ADA180218

Title :   Intense XUV (Extreme Ultraviolet) Radiation Sources.

Descriptive Note : Annual rept. (Final) 1 Aug 83-31 Jul 85,

Corporate Author : MARYLAND UNIV COLLEGE PARK INST FOR PHYSICAL SCIENCE AND TECHNOLOGY

Personal Author(s) : Ginter,M L

PDF Url : ADA180218

Report Date : 31 Jul 1985

Pagination or Media Count : 71

Abstract : In the research, characterizations were performed of the Extreme Ultraviolet outpit of our laser produced plasma system in the 30-1200 A region and have used the system for preliminary studies in high resolution spectroscopy in the grazing incidence region and in soft x ray microlithography. Contents: Laser Produced Plasma Light Sources; XUV and soft x ray Radiation from Laser Produced Plasmas as Laboratory Spectroscopic Sources Laser Produced Plasma Light Sources for High Resolution XUV and VUV Spectroscopy; Soft x ray Lithography using Radiation From Laser Produced Plasmas; Laser Produced Plasma Light Sources for High Resolution XUV and VUV Spectroscopy; High Resolution Spectra of Laser Plasma Light Sources in the Grazing Incidence Region; and Photometric Investigation of a Laser Produced Plasma VUV Light Source.

Descriptors :   *FAR ULTRAVIOLET RADIATION, *ULTRAVIOLET RADIATION, *LIGHT SOURCES, *PLASMAS(PHYSICS), *LASER PUMPING, *X RAY SPECTROSCOPY, GRAZING, HIGH RESOLUTION, INTENSITY, LABORATORY PROCEDURES, LASER BEAMS, LASERS, LITHOGRAPHY, MICROSCOPY, OUTPUT, PHOTOLITHOGRAPHY, PHOTOMETRY, RADIATION, RANGE(EXTREMES), SOFT X RAYS, SPECTRA, VACUUM ULTRAVIOLET RADIATION, X RAYS

Subject Categories : Optics
      Plasma Physics and Magnetohydrodynamics
      Nuclear Physics & Elementary Particle Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE