Accession Number : ADA182714

Title :   Growth, Characterization and Device Development in Monocrystalline Diamond Films.

Descriptive Note : Annual rept. 1 Jun 86-31 May 87,

Corporate Author : NORTH CAROLINA STATE UNIV AT RALEIGH SCHOOL OF ENGINEERING

Personal Author(s) : Davis,R F ; Glass,J T ; Lucovsky,G ; Bachmann,K J

PDF Url : ADA182714

Report Date : 01 Jun 1987

Pagination or Media Count : 68

Abstract : An apparatus for the growth of diamond films by remote or immersed microwave plasma chemical vapor deposition (CVD) has been designed. This system will also be capable of testing the effect of ultraviolet photon bombardment and heated tungsten filament on diamond growth. Analytical instruments have been purchased to conduct Auger Electron Spectroscopy (AES), X ray Photoelectron Spectroscopy (XDS) and Reverse View Low Energy Electron Diffraction (RVLEED). A chamber to be attached to the CVD apparatus to house these analytical techniques is being designed. Copper single crystal boules have been grown for use as substrates during diamond CVD and a system for the deposition of dielectrics onto diamond has been constructed. Finally, several diamond films from outside sources have been examined by various analytical techniques including AES, XPS, as well as scanning and transmission electron microscopy.

Descriptors :   *SINGLE CRYSTALS, *DIAMONDS, *FILMS, AUGER ELECTRON SPECTROSCOPY, DEPOSITION, DIELECTRICS, GROWTH(GENERAL), FILAMENTS, HEAT, TUNGSTEN, SUBSTRATES, PHOTON BOMBARDMENT, ULTRAVIOLET RADIATION, COPPER, ELECTRON DIFFRACTION, LOW ENERGY, ELECTRON MICROSCOPY, TRANSMITTANCE, X RAY PHOTOELECTRON SPECTROSCOPY

Subject Categories : Crystallography

Distribution Statement : APPROVED FOR PUBLIC RELEASE