Accession Number : ADA183250
Title : Impedance and Admittance Measurements at Intercalated n-HfS2/Non-Aqueous Electrolyte Interface.
Descriptive Note : Technical rept. Oct 86-Jul 87,
Corporate Author : ELTRON RESEARCH INC AURORA IL
Personal Author(s) : Semkow,Krystyna W ; Pujare,Nirupama U ; Sammells,Anthony F
PDF Url : ADA183250
Report Date : Jul 1987
Pagination or Media Count : 23
Abstract : Capacitance, impedance and admittance studies were performed on single crystal n-HfS2 before an after copper intercalation from acetonitrile based electrolyte. The n-HfS2/non-aqueous electrolyte interface was modelled by equivalent R-C circuits containing frequency dependent elements. Electrochemical intercalation by copper into n-HfS2 introduced Faradaic conductance effects. The composition of copper intercalated n-HfS2 in close proximity to the interfacial region was obtained assuming a diffusion coefficient for copper in n-HfS2 of 10 to the 8th sq. cm./sec. The photoanode demonstrated apparent degeneracy for 0.1 miles of intercalated copper, suggesting tat progressive electronic population of the n-HfS2 conduction band was occurring. Capacitance values for intercalated n-HfS2 were of the order 10 to the 6thF/cm squared. Keywords: Hafnium disulfide, capacitance, impedance, admittance spectroscopy, copper intercalation.
Descriptors : *ELECTROLYTES, *HAFNIUM, *SULFIDES, ACETONITRILE, ADMITTANCE, SPECTROSCOPY, CAPACITANCE, COPPER, ELECTRONICS, POPULATION, FREQUENCY, INTERFACES, ADMITTANCE, MEASUREMENT, DIFFUSION COEFFICIENT, CONDUCTIVITY, FARADAY EFFECT
Subject Categories : Inorganic Chemistry
Distribution Statement : APPROVED FOR PUBLIC RELEASE