Accession Number : ADA184766
Title : Ion Plating: Fundamental Processing Studies and Synthesis of High Performance Coatings.
Descriptive Note : Final rept. Nov 83-Apr 87,
Corporate Author : ILLINOIS UNIV AT URBANA DEPT OF MATERIALS SCIENCE AND ENGINEERING
Personal Author(s) : Rigsbee,J M
PDF Url : ADA184766
Report Date : 04 Aug 1987
Pagination or Media Count : 6
Abstract : Ion plating is a physical vapor deposition process which uses a plasma to modify the microstructure/microchemistry of thin film coatings. This research has directly shown that processing variables such as plasma energy/density; substrate temperature; deposition rate; and substrate surface chemistry directly effect the deposited film microstructure and chemistry. This processing technique allows mechanically strong/chemically graded interface layers to be produced between dissimilar material. Film adhesion with this process is correspondingly excellent. This process was used to produce corrosion and wear resistant hard coatings.
Descriptors : *PROTECTIVE COATINGS, ION BOMBARDMENT, PLATING, VAPOR DEPOSITION, NUCLEATION, THIN FILMS, MICROSTRUCTURE, TITANIUM, NITRIDES, OXIDES, ADHESION, CORROSION RESISTANCE, WEAR RESISTANCE, HARDNESS
Subject Categories : Coatings, Colorants and Finishes
Distribution Statement : APPROVED FOR PUBLIC RELEASE