Accession Number : ADA184807

Title :   Computer Modeling of Complete IC Fabrication Process.

Descriptive Note : Final rept. 1 Oct 83-1 Feb 87,

Corporate Author : STANFORD UNIV CA

Personal Author(s) : Dutton, Robert W

PDF Url : ADA184807

Report Date : 28 May 1987

Pagination or Media Count : 34

Abstract : The focus of this research effort is the development of fundamental algorithms for process and device modeling as well as novel integration of the tools for advanced IC technology design. The development of the first complete 2D process simulator, SUPREM 4, is reported. The algorithms are discussed as well as application to local-oxidation and extrinsic diffusion conditions occur in Cmos AND BiCMOS technologies. The evolution of 1D (SEDAN) and 2D (PISCES) device analysis is discussed. The application of SEDAN to a variety of non-silicon technologies (GaAs and HgCdTe) are considered. A new multi-window analysis capability for PISCES which exploits Monte Carlo analysis of hot carriers has been demonstrated and used to characterize a variety of silicon MOSFET and GaAs MESFET effects. A parallel computer implementation of PISCES has been achieved using a Hypercube architecture. The PISCES program has been used for a range of important device studies including: latchup, analog switch analysis, MOSFEt capacitance studies and bipolar transient device for ECL gates. The program is broadly applicable to RAM and BiCMOS technology analysis and design. In the analog switch technology area this research effort has produced a variety of important modeling and advances.

Descriptors :   *COMPUTER AIDED MANUFACTURING, *COMPUTERIZED SIMULATION, *COMPUTER AIDED DESIGN, *INTEGRATED CIRCUITS, ALGORITHMS, PARALLEL PROCESSING, MONTE CARLO METHOD, TRANSIENTS, SWITCHES, MOSFET SEMICONDUCTORS, GALLIUM ARSENIDES, FIELD EFFECT TRANSISTORS, RANDOM ACCESS COMPUTER STORAGE

Subject Categories : Mfg & Industrial Eng & Control of Product Sys
      Computer Programming and Software
      Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE