Accession Number : ADA187490

Title :   A Viscoelastic BEM (Boundary Element Method) for Modeling Oxidation,

Corporate Author : MASSACHUSETTS INST OF TECH CAMBRIDGE

Personal Author(s) : Tung, Thye-Lai ; Connor, Jerome ; Antoniadis, Dimitri A

PDF Url : ADA187490

Report Date : Mar 1987

Pagination or Media Count : 10

Abstract : A viscoelastic boundary element has been developed to model the motion of silicon dioxide and silicon nitride during thermal oxidation of silicon. This technique uses Kelvin's solution reformulated according to the correspondence principle on viscoelasticity. Constant velocity loading is chosen to ensure smooth variations in displacement and stress behavior for a wide range of relaxation times.

Descriptors :   *OXIDES, *SILICON, *SILICON DIOXIDE, *SILICON NITRIDES, *THERMOCHEMISTRY, *BOUNDARY VALUE PROBLEMS, BOUNDARIES, DISPLACEMENT, MODELS, MOTION, RANGE(EXTREMES), RELAXATION, VELOCITY, VISCOELASTICITY, OXIDES, FLOW, FINITE ELEMENT ANALYSIS

Subject Categories : Physical Chemistry
      Fluid Mechanics

Distribution Statement : APPROVED FOR PUBLIC RELEASE