Accession Number : ADA187616
Title : Apparatus for the Study of Silicon Film Deposition and Silicon Etching.
Descriptive Note : Final rpt. 1 Aug 86-31 Jul 87,
Corporate Author : PRINCETON UNIV NJ DEPT OF CHEMICAL ENGINEERING
Personal Author(s) : Benziger, Jay
PDF Url : ADA187616
Report Date : 31 Jul 1987
Pagination or Media Count : 4
Abstract : A special vacuum system used to study the surface reactions in thin film deposition and etching was equipped with surface analytical techniques and ion sputtering for preparing and characterizing surfaces. X-ray and ultraviolet photoelectron spectroscopy systems were obtained from Vacuum Science Workshop and installed in a 2-chamber vacuum system along with an ion sputtering gun for sample cleaning. These techniques will be used in conjunction with infrared ellipsometry and modulated molecular beam techniques to elucidate the kinetics and mechanisms of surface reactions of silicon deposition and etching.
Descriptors : *DEPOSITION, *ETCHING, *SILICON, *THIN FILMS, ELLIPSOMETERS, FILMS, GUNS, INFRARED RADIATION, IONS, MODULATION, MOLECULAR BEAMS, PHOTOELECTRON SPECTRA, SPUTTERING, SURFACE REACTIONS, SURFACES, ULTRAVIOLET SPECTROSCOPY, VACUUM, VACUUM APPARATUS, WORKSHOPS
Subject Categories : Test Facilities, Equipment and Methods
Distribution Statement : APPROVED FOR PUBLIC RELEASE