Accession Number : ADA188366

Title :   Preparation and Characterization of Thin Films of Alumina by Metalorganic Chemical Vapor Deposition.

Descriptive Note : Technical rept.,

Corporate Author : BROWN UNIV PROVIDENCE RI DEPT OF CHEMISTRY

Personal Author(s) : Fournier, J ; DeSisto, W ; Brusasco, R ; Sosnowski, M ; Kershaw, R

PDF Url : ADA188366

Report Date : 27 Oct 1987

Pagination or Media Count : 11

Abstract : A simple novel horizontal reactor was used to prepare 2000 angstrom films of alumina on silicon substrates by the thermal decomposition of aluminum tri isopropoxide at temperatures between 350 and 500 C. The films were annealed in oxygen to test suitability towards shrinkage and were characterized as to porosity, the presence of OH absorption bands in the infrared transmittance spectra and breakdown voltage. Keywords: Material index; Alumina tri-isopropoxide; Silicon.

Descriptors :   *ALUMINUM OXIDES, *ORGANOMETALLIC COMPOUNDS, *THIN FILMS, *VAPOR DEPOSITION, ABSORPTION SPECTRA, BAND SPECTRA, CHEMICAL REACTIONS, INDEXES, INFRARED SPECTRA, MATERIALS, OXYGEN, POROSITY, PYROLYSIS, SHRINKAGE, SILICON, SUBSTRATES, TRANSMITTANCE

Subject Categories : Coatings, Colorants and Finishes
      Mfg & Industrial Eng & Control of Product Sys
      Fabrication Metallurgy

Distribution Statement : APPROVED FOR PUBLIC RELEASE