Accession Number : ADA188366
Title : Preparation and Characterization of Thin Films of Alumina by Metalorganic Chemical Vapor Deposition.
Descriptive Note : Technical rept.,
Corporate Author : BROWN UNIV PROVIDENCE RI DEPT OF CHEMISTRY
Personal Author(s) : Fournier, J ; DeSisto, W ; Brusasco, R ; Sosnowski, M ; Kershaw, R
PDF Url : ADA188366
Report Date : 27 Oct 1987
Pagination or Media Count : 11
Abstract : A simple novel horizontal reactor was used to prepare 2000 angstrom films of alumina on silicon substrates by the thermal decomposition of aluminum tri isopropoxide at temperatures between 350 and 500 C. The films were annealed in oxygen to test suitability towards shrinkage and were characterized as to porosity, the presence of OH absorption bands in the infrared transmittance spectra and breakdown voltage. Keywords: Material index; Alumina tri-isopropoxide; Silicon.
Descriptors : *ALUMINUM OXIDES, *ORGANOMETALLIC COMPOUNDS, *THIN FILMS, *VAPOR DEPOSITION, ABSORPTION SPECTRA, BAND SPECTRA, CHEMICAL REACTIONS, INDEXES, INFRARED SPECTRA, MATERIALS, OXYGEN, POROSITY, PYROLYSIS, SHRINKAGE, SILICON, SUBSTRATES, TRANSMITTANCE
Subject Categories : Coatings, Colorants and Finishes
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE