Accession Number : ADA188588

Title :   Chemical Cleaning of Metal Surfaces in Vacuum Systems by Exposure to Reactive Gases.

Descriptive Note : Technical rept.,

Corporate Author : MAINE UNIV AT ORONO LAB FOR SURFACE SCIENCE AND TECHNOLOGY

Personal Author(s) : Grunze, M ; Ruppender, H ; Elshazly, O

PDF Url : ADA188588

Report Date : 10 Nov 1987

Pagination or Media Count : 32

Abstract : Chemical surface cleaning procedures for metals using oxidation/reduction cycles by exposure to oxidizing (oxygen, nitric oxide) and reducing (Hydrogen, Ammonia) gases are summarized and are briefly discussed for iron, nickel, palladium, copper and silver surfaces. We also present data on the reduction of gaseous contaminants in a stainless steel UHV system by flowing nitric oxide through the system during bake-out Keywords: Vacuum chambers.

Descriptors :   *CHEMICAL CLEANING, AMMONIA, CONTAMINANTS, COPPER, HYDROGEN, IRON, METALS, NICKEL, NITROGEN OXIDES, OXYGEN, REACTIVE GASES, SILVER, STAINLESS STEEL, SURFACES, VACUUM APPARATUS, VACUUM CHAMBERS, PALLADIUM, SURFACE FINISHING, OXIDATION REDUCTION REACTIONS

Subject Categories : Inorganic Chemistry
      Solvents, Cleaners, and Abrasives
      Physical Chemistry

Distribution Statement : APPROVED FOR PUBLIC RELEASE