Accession Number : ADA188712

Title :   Thin-Film Diffusion Barriers for Metal-Semiconductor Contacts,

Corporate Author : CALIFORNIA INST OF TECH PASADENA

Personal Author(s) : Nicolet, M-A

PDF Url : ADA188712

Report Date : Jan 1987

Pagination or Media Count : 9

Abstract : The notion of a diffusion barrier is discussed as it applies to thin films, and to metal semiconductor contacts in particular. The electrical requirements on the barrier material are easily met; those of the thermodynamic stability of the barrier and the low atomic diffusivity in the barrier are not. The critical influence of the deposition process on the latter property is pointed out. Several different ways to solve the problem are discussed by examples.

Descriptors :   *METAL CONTACTS, *SEMICONDUCTORS, *THIN FILMS, BARRIERS, DEPOSITION, DIFFUSION, ELECTRICAL PROPERTIES, REQUIREMENTS, REPRINTS

Subject Categories : Solid State Physics
      Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE