Accession Number : ADA189288

Title :   Characterization of Redox Sates of Nickel Hydroxide Film Electrodes by In-Situ Raman Spectroscopy.

Descriptive Note : Technical rept. 1 Oct 86-30 Sep 87,

Corporate Author : PURDUE UNIV LAFAYETTE IN DEPT OF CHEMISTRY

Personal Author(s) : Desilvestro, J ; Corrigan, D A ; Weaver, M J

PDF Url : ADA189288

Report Date : 25 Sep 1987

Pagination or Media Count : 37

Abstract : Thin films of nickel hydroxide deposited on gold electrodes have been characterized in detail by in-situ surface Raman spectroscopy in conjunction with electrochemical techniques. Raman spectra were obtained for film thicknesses varying from less than one equivalent monolayer to several hundred monolayers, as determined from the faradaic charge for the cyclic voltammetric oxidation of Ni(OH)2. For the thinnest films, Raman bands at 455/cm and at 480 and 560/cm were obtained for the reduced and oxidized films, respectively, using 647.1 nm excitation at roughened gold. These signals, identified with Ni-OH and Ni-O vibrations from deuterium isotope data, were diagnosed as arising from surface-enhanced Raman scattering (SERS) in view of their absence for the reduced film when using the latter conditions for thicker oxidized films, which were consistent with resonance Raman scattering (RRS). Keywords: In situ, Surface raman spectroscopy, Nickel hydroxide, Films, Electrodes, Cyclic voltammetry.

Descriptors :   *ELECTROCHEMISTRY, *FILMS, *HYDROXIDES, *NICKEL COMPOUNDS, *RAMAN SPECTROSCOPY, BANDS(STRIPS), CYCLES, DEUTERIUM, ELECTRODES, GOLD, ISOTOPES, LAYERS, LIGHT SCATTERING, OXIDATION, RAMAN SPECTRA, REDUCTION, RESONANCE SCATTERING, SURFACES, THICKNESS, THIN FILMS, VOLTAMMETRY

Subject Categories : Physical Chemistry
      Electricity and Magnetism

Distribution Statement : APPROVED FOR PUBLIC RELEASE