Accession Number : ADA190575
Title : Modeling the Effects of Heavy Charged Particles on MOSFETs (Metal-Oxide-Semiconductor Field Effect Transistors).
Descriptive Note : Master's thesis,
Corporate Author : AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OH SCHOOL OF ENGINEERING
Personal Author(s) : Kattner, Kevin M
PDF Url : ADA190575
Report Date : Mar 1988
Pagination or Media Count : 49
Abstract : A simple model to characterize the effects of heavy charged particles on metal-oxide semiconductor field-effect transistors (MOSFET) is presented. The model is applied to experimental results provided by the Air Force Weapons Laboratory, and an attempt made to simulate saturation phenomena observed in the threshold voltage change. The model assumes all trapped holes are within a few nanometers of the oxide-semiconductor interface, and takes into account the resultant counter electric field, and its effect on the fraction escaping recombination. An equation relating threshold voltage change as a function of dose is derived and used, but does not duplicate the saturation effect. This is because the charge trapped near the interface reduces the internal oxide electric field very little. However, similarities in p-channel and n-channel MOSFET damage sensitivities indicate considerable bulk charge trapping. This would modulate the internal electric field considerably. To determine whether this accounts for saturation will necessitate refinement of the model, taking hole transport and bulk trapping into account.
Descriptors : *BULK SEMICONDUCTORS, *CHARGED PARTICLES, *FIELD EFFECT TRANSISTORS, *METAL OXIDE SEMICONDUCTORS, *MOSFET SEMICONDUCTORS, *TRAPPING(CHARGED PARTICLES), ELECTRIC CHARGE, ELECTRIC FIELDS, EQUATIONS, HOLES(OPENINGS), INTERNAL, MODELS, OXIDES, REFINING, SATURATION, THRESHOLD EFFECTS, TRANSISTORS, VOLTAGE, THESES
Subject Categories : Electrical and Electronic Equipment
Solid State Physics
Atomic and Molecular Physics and Spectroscopy
Distribution Statement : APPROVED FOR PUBLIC RELEASE