Accession Number : ADA191228

Title :   Micro-Raman Analysis of Dielectric Optical Thin Films.

Descriptive Note : Final technical rept. 1 May 85-30 Sep 87,

Corporate Author : ROCHESTER UNIV N Y LAB FOR LASER ENERGETICS

Personal Author(s) : Schmid, Ansgar

PDF Url : ADA191228

Report Date : 07 Jan 1988

Pagination or Media Count : 24

Abstract : Wide-band-gap dielectric thin films up to 6 micrometer in thickness are characterized by spontaneous and stimulated Raman-gain microscopy. Materials surveyed are Aluminum oxide, Yttrium oxide, Zirconium oxide, Hafnium oxide, and Tantalum oxide. 1-micrometer sized surface defects on Y2O3 are investigated.

Descriptors :   *DIELECTRIC FILMS, *OPTICAL MATERIALS, *RAMAN SPECTROSCOPY, *THIN FILMS, ALUMINUM OXIDES, HAFNIUM COMPOUNDS, OXIDES, TANTALUM, THICKNESS, YTTRIUM OXIDES, ZIRCONIUM OXIDES

Subject Categories : Inorganic Chemistry

Distribution Statement : APPROVED FOR PUBLIC RELEASE