Accession Number : ADA192956

Title :   Equipment for an Advanced Electron Beam Lithography System.

Descriptive Note : Final rept. 13 Jul 86-14 Jul 87,

Corporate Author : STATE UNIV OF NEW YORK AT STONY BROOK DEPT OF PHYSICS

Personal Author(s) : Lukens, James

PDF Url : ADA192956

Report Date : 14 Jul 1987

Pagination or Media Count : 4

Abstract : Equipment has been purchased under this grant to develop and build a research electron beam lithography (EBL) system at Stony Brook for the support of research projects on superconducting electronics. The system is based on an Array scanning electron microscope (SEM) which has been modified to accept a laser interferometer to monitor stage position. High precision nonmagnetic stages have been added, and interface electronics have been designed and built to permit control of the beam position and beam blanking by an external computer. The completed system is designed to write over a four inch wafer with a resolution of 30nm and a positional accuracy of 100nm.

Descriptors :   *ELECTRON BEAMS, *ELECTRONIC SCANNERS, *LITHOGRAPHY, BEAM STEERING, COMPUTERS, ELECTRON MICROSCOPES, ELECTRONIC EQUIPMENT, ELECTRONICS, INTERFACES, MAGNETIC PROPERTIES, OPTICAL INTERFEROMETERS, POSITION(LOCATION), PRECISION, SUPERCONDUCTIVITY, CONTROL SYSTEMS, LASER APPLICATIONS, ELECTRONIC EQUIPMENT

Subject Categories : Printing and Graphic Arts
      Electrical and Electronic Equipment
      Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE