Accession Number : ADA195151

Title :   Process Model Construction and Optimization Using Statistical Experimental Design,

Corporate Author : MASSACHUSETTS INST OF TECH CAMBRIDGE MICROSYSTEMS RESEARCH CENTER

Personal Author(s) : Sachs, Emmanuel ; Prueger, George

PDF Url : ADA195151

Report Date : Apr 1988

Pagination or Media Count : 9

Abstract : A methodology is presented for the construction of process models by the combination of physically based mechanistic modeling and statistical experimental design in order to create smart response surfaces. In contrast to the process independent polynomial fit of the conventional response surface method, smart response surfaces derive their basic shape from the process physics and are then calibrated using designed experiments. This method provides for a surface of better representational accuracy using the same of fewer experimental points. This method has been applied to the development of a model for the low pressure chemical vapor deposition (LPCVD) of polysilicon, a process used in the manufacture of VLSI circuits. A one-dimensional finite difference model of the LPCVD process was constructed. A Taguchi orthogonal array experiment was conducted. A confirming experiment performed at the parameter levels indicated by the Taguchi optimization, served to confirm the validity of the experimental procedure. The experimental results will subsequently be used to calibrate the mechanistic model.

Descriptors :   *EXPERIMENTAL DESIGN, *MATHEMATICAL MODELS, *VAPOR DEPOSITION, ACCURACY, ARRAYS, FINITE DIFFERENCE THEORY, ONE DIMENSIONAL, OPTIMIZATION, ORTHOGONALITY, PARAMETERS, PHYSICS, SHAPE, STATISTICS, SURFACES, LOW PRESSURE, POLYSILICONS, INTEGRATED CIRCUITS, APPLIED MATHEMATICS, FABRICATION

Subject Categories : Operations Research
      Coatings, Colorants and Finishes
      Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE