Accession Number : ADA195161
Title : Reactive Plasticizers in Negative E-Beam Resists.
Descriptive Note : Technical rept.,
Corporate Author : CORNELL UNIV ITHACA SCHOOL OF CHEMICAL ENGINEERING
Personal Author(s) : Namaste, Y M ; Obendorf, S K ; Rodriguez, R
PDF Url : ADA195161
Report Date : 16 May 1988
Pagination or Media Count : 25
Abstract : Negative electron resists generally exhibit excellent sensitivity, but suffer from swelling during development which results in poor resolution. A new approach to this problem is presented, in which reactive monomers are blended with host polymers to provide sensitive negative resists with improved resolution. Polychloromethylstyrene (PCMS) and VMCH (a terpolymer containing 86% vinyl chloride, 13% vinyl acetate and 1% maleic acid) were both found to be compatible with two reactive monomers, trimethylolpropanetrimethacrylate (TMPTMA) and dipentaerythritolpentaacrylate (DPEPA). Addition of 20% (w/w) of either monomer to PCMs or VMCH resulted in approximately ten fold increases in sensitivity. Keywords: Lithography, Reactive plasticizer, Electron beam.
Descriptors : *LITHOGRAPHY, *PLASTICIZERS, ELECTRON BEAMS, ELECTRONS, MONOMERS, POLYMERS, REACTIVITIES
Subject Categories : Organic Chemistry
Distribution Statement : APPROVED FOR PUBLIC RELEASE