Accession Number : ADA195161

Title :   Reactive Plasticizers in Negative E-Beam Resists.

Descriptive Note : Technical rept.,

Corporate Author : CORNELL UNIV ITHACA SCHOOL OF CHEMICAL ENGINEERING

Personal Author(s) : Namaste, Y M ; Obendorf, S K ; Rodriguez, R

PDF Url : ADA195161

Report Date : 16 May 1988

Pagination or Media Count : 25

Abstract : Negative electron resists generally exhibit excellent sensitivity, but suffer from swelling during development which results in poor resolution. A new approach to this problem is presented, in which reactive monomers are blended with host polymers to provide sensitive negative resists with improved resolution. Polychloromethylstyrene (PCMS) and VMCH (a terpolymer containing 86% vinyl chloride, 13% vinyl acetate and 1% maleic acid) were both found to be compatible with two reactive monomers, trimethylolpropanetrimethacrylate (TMPTMA) and dipentaerythritolpentaacrylate (DPEPA). Addition of 20% (w/w) of either monomer to PCMs or VMCH resulted in approximately ten fold increases in sensitivity. Keywords: Lithography, Reactive plasticizer, Electron beam.

Descriptors :   *LITHOGRAPHY, *PLASTICIZERS, ELECTRON BEAMS, ELECTRONS, MONOMERS, POLYMERS, REACTIVITIES

Subject Categories : Organic Chemistry

Distribution Statement : APPROVED FOR PUBLIC RELEASE