Accession Number : ADA276478
Title : Proceedings of the (37Th) International Symposium on Electron, Ion, and Photon Beams Held in San Diego, California on 1-4 June 1993.
Descriptive Note : Final rept. 15 Apr 93-14 Apr 94,
Corporate Author : MASSACHUSETTS INST OF TECH CAMBRIDGE RESEARCH LAB OF ELECTRONICS
Personal Author(s) : Smith, Henry I.
Report Date : 11 FEB 1994
Pagination or Media Count : 87
Abstract : Partial contents: Lithographic patterning of self-assembled films; Alignment signal failure detection and recovery in real time; Marks for alignment and registration in projection electron lithography; Improvement of heterodyne alignment technique for x-ray steppers; Confocal filtering of the instantaneous image in scanned darkfield alignment; Novel on-axis interferometric alignment method with sub-10 nm precision; Focused-ion beam induced deposition of copper; Focused ion beam XeF2 etching of materials for phase-shift masks; Selective electroless plating on electron beam seeded nanostructures; Modification of polymer surfaces and the fabrication of submicron-scale functionalized structures by deep-ultraviolet and electron-beam lithography; Characteristics of ion beam assisted etching of GaAs: Surface stoichiometry; Resolution limits in electron-beam induced tungsten deposition
Descriptors : *PHOTON BEAMS, *ELECTRON BEAMS, *ION BEAMS, SYMPOSIA, LITHOGRAPHY, ALIGNMENT, HETERODYNING, FILTRATION, COPPER, XENON, FLUORINE, ETCHING, ELECTROLESS PLATING, POLYMERS, GERMANIUM, GALLIUM ARSENIDES, SEMICONDUCTORS, FIELD EFFECT TRANSISTORS, QUANTUM WELLS, PLASMAS(PHYSICS), OPTICS, SOFT X RAYS.
Subject Categories : Optics
Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE