Accession Number : ADA289038
Title : FTIR Studies of CH3OH On Porous Silicon.
Descriptive Note : Technical rept.,
Corporate Author : PITTSBURGH UNIV PA SURFACE SCIENCE CENTER
Personal Author(s) : Glass, John A., Jr. ; Wovchko, Edward A. ; Yates, John T., Jr
PDF Url : ADA289038
Report Date : NOV 1994
Pagination or Media Count : 9
Abstract : Fourier transform infrared spectroscopy (FTIR) was used to investigate the reaction of methanol with porous silicon and hydrogen passivated porous silicon. At 300 K methanol adsorbs onto hydrogen free porous silicon by cleavage of the O-H bond. Both of the resulting surface species, Si-H and Si-OCH3, were determined to be stable up to approx. 500 K. Above 500 K the Si-0CH3 moiety decomposes by breakage of the C-O and C-H bonds. The resulting carbon and oxygen were incorporated into the porous layer and additional Si-H surface species were detected. Further heating to 900 K removed the Si-H surface species. Adsorption of methanol onto hydrogen-passivated porous silicon did not occur until 600 K- At temperatures beyond 600 K, oxygen and carbon incorporation into the porous layer and Si-0CH3, Si-CH3, - and Si-H surface species were seen. The previously unseen Si-CH3 surface species is believed to be stabilized by oxygen incorporation
Descriptors : *FOURIER TRANSFORMATION, *INFRARED SPECTROSCOPY, *SILICON, *POROUS MATERIALS, STABILIZATION, REMOVAL, LAYERS, ADSORPTION, CRYSTALS, CARBON, HYDROGEN, SILOXANES, SURFACES, OXYGEN, CHEMICAL BONDS, METHANOLS, ORGANIC MATERIALS, SILANES, SOLVENTS, SURFACE CHEMISTRY, CONTAMINATION, CLEAVAGE, PASSIVITY.
Subject Categories : Inorganic Chemistry
Laminates and Composite Materials
Distribution Statement : APPROVED FOR PUBLIC RELEASE