Accession Number : ADA289179
Title : Adsorption and Dissociation of Trimethylgallium on Si(001): An Atomically Resolved STM Study.
Descriptive Note : Interim technical rept.,
Corporate Author : WISCONSIN UNIV-MADISON DEPT OF CHEMISTRY
Personal Author(s) : Bronikowski, Michael ; Hamers, Robert J.
PDF Url : ADA289179
Report Date : 20 DEC 1994
Pagination or Media Count : 33
Abstract : The adsorption and dissociation of trimethylgallium (TMG, Ga(CH3)3) on the Si(001) surface has been studied using Scanning Tunneling Microscopy (STM). The products of TMG dissociation are identified by their bonding location with respect to the underlying Si(001) lattice, by bias dependent imaging and from detailed counting statistics. TMG is found to adsorb dissociatively at room temperature, yielding a methyl group and a dimethylgallium fragment bound to the surface. The Ga(CH3)2 groups produced by TMG dissociation are somewhat mobile at room temperature but are bonded more strongly near surface defects. Further dissociation yields gallium atoms on the surface, but no additional methyl groups. It is proposed that this second stage of reaction involves an intramolecular reaction to produce ethane, which desorbs into the gas phase, and gallium atoms. The gallium atoms are observed to arrange into single rows of gallium dimers which bind epitaxially on the Si surface. Heating the surface to 150 deg C completely decomposes the TMG fragments, yielding Ga atoms and CH3 groups.
Descriptors : *METHYL RADICALS, *ADSORPTION, *SILICON, *GALLIUM, *DISSOCIATION, SCANNING, POSITION(LOCATION), TUNNELING(ELECTRONICS), ELECTRONIC SCANNERS, RESOLUTION, COUNTING METHODS, STATISTICS, ATOMS, VAPOR PHASES, ROOM TEMPERATURE, MICROSCOPY, ELECTRON MICROSCOPY, SURFACES, DEFECTS(MATERIALS), RESPONSE, CHEMICAL REACTIONS, MOBILE, IMAGES, BONDING, BIAS, ATOMIC PROPERTIES, ETHANES, DIMERS.
Subject Categories : Physical Chemistry
Distribution Statement : APPROVED FOR PUBLIC RELEASE