Accession Number : ADA289742
Title : Low Voltage Electron Beam Lithography,
Corporate Author : NAVAL RESEARCH LAB WASHINGTON DC
Personal Author(s) : Browning, R.
PDF Url : ADA289742
Report Date : AUG 1994
Pagination or Media Count : 2
Abstract : The software has been completed for Monte-Carlo simulation of scattering of low energy electrons from a line edge using the new low voltage scattering cross-sections developed under this contract. The software properly treats crossings of all surfaces. For example between the sidewall-gap-substrate. This includes re-entrant sidewalls with an undercut. (KAR)
Descriptors : *COMPUTER PROGRAMS, *COMPUTERIZED SIMULATION, *LITHOGRAPHY, *ELECTRON BEAMS, SCATTERING, EDGES, MONTE CARLO METHOD, SURFACES, LOW ENERGY, CROSS SECTIONS.
Subject Categories : Mfg & Industrial Eng & Control of Product Sys
Printing and Graphic Arts
Distribution Statement : APPROVED FOR PUBLIC RELEASE