Accession Number : ADA289742

Title :   Low Voltage Electron Beam Lithography,

Corporate Author : NAVAL RESEARCH LAB WASHINGTON DC

Personal Author(s) : Browning, R.

PDF Url : ADA289742

Report Date : AUG 1994

Pagination or Media Count : 2

Abstract : The software has been completed for Monte-Carlo simulation of scattering of low energy electrons from a line edge using the new low voltage scattering cross-sections developed under this contract. The software properly treats crossings of all surfaces. For example between the sidewall-gap-substrate. This includes re-entrant sidewalls with an undercut. (KAR)

Descriptors :   *COMPUTER PROGRAMS, *COMPUTERIZED SIMULATION, *LITHOGRAPHY, *ELECTRON BEAMS, SCATTERING, EDGES, MONTE CARLO METHOD, SURFACES, LOW ENERGY, CROSS SECTIONS.

Subject Categories : Mfg & Industrial Eng & Control of Product Sys
      Printing and Graphic Arts

Distribution Statement : APPROVED FOR PUBLIC RELEASE