Accession Number : ADA290789

Title :   Pulsed Laser Deposition of Thin Film Material for Nonlinear Waveguides.

Descriptive Note : Final rept. 15 Oct 90-14 Aug 94,

Corporate Author : PUERTO RICO UNIV MAYAGUEZ DEPT OF PHYSICS

Personal Author(s) : Fernandez, Felix E.

PDF Url : ADA290789

Report Date : 09 OCT 1994

Pagination or Media Count : 19

Abstract : Pulsed Laser Deposition (PLO) was used in order to fabricate thin films of various classes or materials of interest for future nonlinear optical waveguide devices. Materials investigated included potassium niobate, potassium tantalate niobate (KTN), and aluminum nitride. SiU films were also grown and studied as a step in producing doped-glass films via PLD. The films were characterized with several techniques, including Rutherford backscattering spectroscopy, x-ray diffraction, optical microscopy, electron microscopy, and when feasible, ellipsometry, and UV-visible light transmission. In addition, a method was devised to enhance the thickness uniformity or PLU-fabricated thin films, which is notoriously poor. This method uses a comic optic or novel design in order to produce concentric annular sources at the target being ablated. In principle, uniform coverage within rew percent is achievable for substrate sizes or a few inches, using current technology. (MM)

Descriptors :   *THIN FILMS, *PULSED LASERS, SUBSTRATES, GLASS, BACKSCATTERING, DEPOSITION, OPTICAL WAVEGUIDES, ALUMINUM, DOPING, CRYSTAL GROWTH, POTASSIUM.

Subject Categories : Electrical and Electronic Equipment
      Lasers and Masers

Distribution Statement : APPROVED FOR PUBLIC RELEASE