Accession Number : ADA290860
Title : Compact Substrate Heater for Use in an Oxidizing Atmosphere.
Descriptive Note : Professional paper,
Corporate Author : NAVAL COMMAND CONTROL AND OCEAN SURVEILLANCE CENTER RDT AND E DIV SAN DIEGO CA
Personal Author(s) : Jones, T. E. ; McGinnis, W. C. ; Briggs, J. S.
PDF Url : ADA290860
Report Date : DEC 1994
Pagination or Media Count : 16
Abstract : A compact heater, designed for the deposition of thin films at high temperatures in an oxidizing atmosphere or vacuum, is described. The heater, including an oxygen-resistant case and the attached substrate, can be loaded into a vacuum deposition chamber through a small-diameter load-lock system, and will operate in 0 to 1 atmosphere of oxygen at temperatures up to at least 800 deg C. Heat is generated resistively, and the substrates are heated directly by thermal conduction. The heater was built specifically to heat substrates during the growth of high-temperature superconducting thin films. (AN)
Descriptors : *THIN FILMS, *THERMAL CONDUCTIVITY, *HIGH TEMPERATURE SUPERCONDUCTORS, HIGH TEMPERATURE, FABRICATION, SUBSTRATES, ION BEAMS, VACUUM CHAMBERS, OXYGEN, OXIDATION, SPUTTERING, VACUUM DEPOSITION, THERMAL STRESSES, HEATERS.
Subject Categories : Electricity and Magnetism
Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE