Accession Number : ADA292418

Title :   The Photomask Japan '94 Held in Kawasaki Science Park, Kanagawa, Japan on 22 April 1994.

Descriptive Note : Technical rept.,

Corporate Author : ASIAN OFFICE OF AEROSPACE RESEARCH AND DEVELOPMENT APO AP 96337-0007

Personal Author(s) : Yakura, S. J.

PDF Url : ADA292418

Report Date : 22 APR 1994

Pagination or Media Count : 6

Abstract : The Photomask Japan 94 symposium, the first photomask meeting in the Far East, was held 22 Apr 94 in Kanagawa, Japan. In this one day meeting, 54 papers were presented covering such topics as mask fabrication, phase shift mask, x-ray and electron-beam masks, and metrology and equipment. In this report, selected papers on the development of sub 0.5 micrometer size masks are discussed. (AN)

Descriptors :   *LITHOGRAPHY, *PHOTOMASKING, SYMPOSIA, COMPUTER AIDED DESIGN, THIN FILMS, FABRICATION, INTEGRATED CIRCUITS, ETCHING, X RAYS, JAPAN, MEMORY DEVICES, ELECTRON BEAMS, OPTICAL INTERFEROMETERS, COMPUTER AIDED MANUFACTURING, MASKS, METROLOGY, PHASE SHIFT.

Subject Categories : Mfg & Industrial Eng & Control of Product Sys
      Printing and Graphic Arts

Distribution Statement : APPROVED FOR PUBLIC RELEASE