Accession Number : ADA294179

Title :   Ion-Assisted Deposition of Optical Thin Films at Different Ion Beam Energies,

Corporate Author : NATIONAL AIR INTELLIGENCE CENTER WRIGHT-PATTERSON AFB OH

Personal Author(s) : Ruiying, Fan ; Yuemei, Lu

PDF Url : ADA294179

Report Date : 11 APR 1995

Pagination or Media Count : 10

Abstract : This article, using TiO2 thin films as examples, studied and analyzed the optical properties, laser damage threshold values, and microstructures of thin films associated with ion assisted sedimentation at different energies. jg

Descriptors :   *OPTICAL PROPERTIES, *THIN FILMS, *ION BEAMS, *DEPOSITION, *LASER DAMAGE, MICROSTRUCTURE, THRESHOLD EFFECTS, ENERGY, OPTICAL MATERIALS, TRANSLATIONS, TITANIUM DIOXIDE, SEDIMENTATION, CHINA, CHINESE LANGUAGE.

Subject Categories : Solid State Physics
      Inorganic Chemistry
      Physical Chemistry
      Optics
      Particle Accelerators

Distribution Statement : APPROVED FOR PUBLIC RELEASE