Accession Number : ADA294190
Title : Influence of CO2 Continuous Laser Preprocessed Substrates on Optical Thin Film Damage Thresholds,
Corporate Author : NATIONAL AIR INTELLIGENCE CENTER WRIGHT-PATTERSON AFB OH
Personal Author(s) : Zhouling, Wu ; Yang, Gao ; Zhengxiu, Fan ; Zhijiang, Wang
PDF Url : ADA294190
Report Date : 26 APR 1995
Pagination or Media Count : 17
Abstract : As far as experimental research into the influences of CO2 laser preprocessed substrates on optical thin film damage threshold values is concerned, it was discovered that, with regard to single layer films and antireflective coatings, radiation pretreatment causes threshold values to clearly go up. At their highest, they reach 5 times those not radiation treated. However, on high reflection films, radiation pretreatment has no great influence. Using repetition frequency pulse photothermal deflection techniques, real time studies were done of corresponding relationships associated with light absorption and damage. Using pulsed time resolved light deflection technology, precise determinations were made of the locations associated with the occurrence of initial damage on samples in depth and direction. Making use of continuous modulation light deflection techniques--combining Nomarski optical microscope analysis of damage morphology--a number of significant conclusions were reached.
Descriptors : *OPTICAL COATINGS, *ANTIREFLECTION COATINGS, *LASER DAMAGE, OPTICAL EQUIPMENT, REAL TIME, LAYERS, THRESHOLD EFFECTS, THIN FILMS, REFLECTION, OPTICAL ANALYSIS, RADIATION ABSORPTION, LIGHT PULSES, SAMPLING, TRANSLATIONS, CARBON DIOXIDE LASERS, CHINA, TIME STUDIES, CHINESE LANGUAGE.
Subject Categories : Optics
Distribution Statement : APPROVED FOR PUBLIC RELEASE