Accession Number : ADA294537

Title :   Designing Resist Materials for Microlithography.

Descriptive Note : Technical rept.,

Corporate Author : CORNELL UNIV ITHACA NY DEPT OF CHEMISTRY

Personal Author(s) : Frechet, Jean M. ; Havard, Jennifer M. ; Lee, S. M. ; Shim, Sang-Yeon ; Urankar, Edward J.

PDF Url : ADA294537

Report Date : 01 JUN 1995

Pagination or Media Count : 5

Abstract : The design of resist materials for microlithography has become more and more complex due to the ever increasing number of demands that are placed on these materials . In particular it is difficult to introduce new features or new chemistries in resists while still maintaining the 'look and feel' and traditional behavior of well established materials. This presentation focuses on the chemistry of resists based on chemically amplified processes that are readily implemented in novel high performance materials. Both positive-tone and negative-tone imaging schemes are considered as is the development of environmentally friendly materials that obviate the use of organic solvents and can be coated and processed in a fully aqueous system. The importance of a full understanding of the the reactions mechanisms that regulate the performance of the resist is underlined.

Descriptors :   *PHOTOLITHOGRAPHY, WATER, MATERIALS, MICROSCOPY, CHEMISTRY, NAVAL RESEARCH, ORGANIC SOLVENTS, TOUCH.

Subject Categories : Printing and Graphic Arts

Distribution Statement : APPROVED FOR PUBLIC RELEASE