Accession Number : ADA294658

Title :   Effect of Ion Bombardment on Thin Film Properties,

Corporate Author : NATIONAL AIR INTELLIGENCE CENTER WRIGHT-PATTERSON AFB OH

Personal Author(s) : Gu, PeiFu ; Tang, JinFa

PDF Url : ADA294658

Report Date : 05 MAY 1995

Pagination or Media Count : 14

Abstract : Oxygen ions from cold cathode ion guns have been used for bombarding when growing thin films. The effect of ion bombardment on film packing density and moisture absorption is examined. It was shown that the packing density of ZrO2, TiO2 and SiO2 that were bombarded by ions increased to over 0.9 based on the measurement given by a quartz crystal microbalance. As a result of exposure to the moisture in a wet atmosphere, the drift of peak transmission wavelength of interference filters that are made of these materials was reduced by 2/3. This suggests that ion assisted technology maybe capable of producing thin films with superior optical and mechanical properties.

Descriptors :   *OPTICAL PROPERTIES, *THIN FILMS, *TRANSMITTANCE, *PACKING DENSITY, *INFRARED OPTICAL MATERIALS, *ION BOMBARDMENT, PEAK VALUES, MECHANICAL PROPERTIES, SILICON DIOXIDE, ION BEAMS, DRIFT, RADIATION ABSORPTION, INTERFERENCE, TRANSLATIONS, MOISTURE, TITANIUM DIOXIDE, CHINA, ZIRCONIUM OXIDES, INFRARED FILTERS, COLD CATHODE TUBES, CHINESE LANGUAGE.

Subject Categories : Optics
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE