Accession Number : ADA294725

Title :   Microlithographic Mask Development (MMD).

Descriptive Note : Annual rept.

Corporate Author : LORAL FEDERAL SYSTEMS MANASSAS VA

PDF Url : ADA294725

Report Date : 23 MAY 1995

Pagination or Media Count : 40

Abstract : Engineering emphasis during this first year of the Microlithographic Mask Development (MMD) program was focused on establishing the manufacturing capability to fabricate prototype X-ray masks (XRM) and prototype phase shift masks (PSM) for delivery and use by the advanced lithography community. This activity included not only the technical aspects of mask manufacturing such as process optimization, tool procurement and technology acquisition, but also involved the logistics and control systems required in a manufacturing environment, developing the technical plans to meet industry lithography requirements, establishing the support infrastructure for the mask technology, and establishing the business processes required to become a commercially viable enterprise. (MM)

Descriptors :   *LITHOGRAPHY, *MASKS, OPTIMIZATION, MANUFACTURING, TOOLS, FABRICATION, PROTOTYPES, OPTICAL MATERIALS, SUBSTRATES, X RAYS, DEFECTS(MATERIALS), SILICON CARBIDES, PHASE SHIFT.

Subject Categories : Mfg & Industrial Eng & Control of Product Sys
      Printing and Graphic Arts

Distribution Statement : APPROVED FOR PUBLIC RELEASE