Accession Number : ADA299528

Title :   Thin Film Growth with Ions, Clusters, and Metal Compounds.

Descriptive Note : Final rept.,

Corporate Author : MINNESOTA UNIV MINNEAPOLIS DEPT OF CHEMICAL ENGINEERING AND MATERIALS SCIENCE

Personal Author(s) : Weaver, John H.

PDF Url : ADA299528

Report Date : 25 JUL 1995

Pagination or Media Count : 101

Abstract : The central theme of the project involved the interaction of ionized beams with solid surfaces. Such studies are relevant to materials synthesis problems because advanced manufacturing processes involve thin film growth and etching under conditions where energetic ions and clusters are present. While it is known that these ions play an important role, the details of their interactions are poorly understood. A significant part of the program during this funding period dealt with the development of instrumentation that would allow the formation of a beam of ionized clusters, the selection from that beam of those clusters that had a particular mass and energy, and then the deposition of those clusters onto a surface with full control over the parameters of deposition. The source was successfully built and tested. The goal was to study the atomic-scale processes of this ionized cluster beam deposition (ICBD). The plan was to use scanning tunneling microscopy to characterize the clusters that were deposited and to determine the effect on the surface as a function of cluster energy and cluster size. jg p.6

Descriptors :   *IONS, *GROWTH(GENERAL), *THIN FILMS, *CLUSTERING, *METAL COMPOUNDS, CONTROL, METHODOLOGY, SCANNING ELECTRON MICROSCOPES, MANUFACTURING, SIZES(DIMENSIONS), SYNTHESIS, MATERIALS, TUNNELING(ELECTRONICS), ELECTRONIC SCANNERS, ENERGY, ETCHING, ELECTRON MICROSCOPY, SURFACES, DEPOSITION, INSTRUMENTATION, IONIZATION, ENERGETIC PROPERTIES, SOLID BODIES.

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Optics
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE