Accession Number : ADA300305

Title :   Rockford Diamond Technology.

Descriptive Note : Technical rept. no. 4,

Corporate Author : ROCKFORD DIAMOND TECHNOLOGY INC CHAMPAIGN IL

PDF Url : ADA300305

Report Date : 20 JAN 1995

Pagination or Media Count : 6

Abstract : The designs of a gas system for introducing water vapor and a photo-CVD reactor are demonstrated in this month. As mentioned in last report, water vapor has a great potential for the photon activation method. With a closed vessel, water vapor is carried by a stream of argon. The content of water vapor is adjusted and controlled by the flow rate of argon. A diamond growth reactor using pure photon activation is attractive for high purity diamond films with low energy consumption. The quality diamond films will be higher than those grown by microwave methods, in which high energy charged particles in the plasma may damage the films. Furthermore, the diamond grown in the microwave lamp were reported with highly oriented films last month. The trial for better films has not succeeded due to the overheating problem of the microwave system. The experimental work with the internal coupling will be done and studied systematically next month.

Descriptors :   *DIAMONDS, *MICROWAVES, *GASES, *WATER VAPOR, COUPLING(INTERACTION), ACTIVATION, HIGH RATE, PHOTOCHEMICAL REACTIONS, GROWTH(GENERAL), PLASMAS(PHYSICS), FILMS, CHEMICAL VAPOR DEPOSITION, MICROWAVE EQUIPMENT, CHARGED PARTICLES, CARBON, HIGH ENERGY, PURITY, FLOW RATE, LOW ENERGY, INTERNAL, PHOTONS, ARGON, STREAMS, REACTOR OPERATION.

Subject Categories : Inorganic Chemistry
      Physical Chemistry
      Crystallography
      Electricity and Magnetism
      Radiofrequency Wave Propagation

Distribution Statement : APPROVED FOR PUBLIC RELEASE