Accession Number : ADA301107
Title : Photopolymers - Principles, Processes and Materials.
Descriptive Note : Technical papers.
Corporate Author : SOCIETY OF PLASTICS ENGINEERS BROOKFIELD CENTER CT
PDF Url : ADA301107
Report Date : NOV 1967
Pagination or Media Count : 242
Abstract : Partial contents: Ultraviolet light sources for photopolymerization; Reciprocity failure in films of flash exposed dichromate sensitized polyvinyl alcohol; Sensitometric measurements on Kodak Ortho Resist at microsecond exposure times; Characteristics of images formed in Kodak thin film resist by projection exposures; Photopolymers from monomers - general survey of recent developments; Photoelectrolytic polymerization processes; Photopolymerization studies: I. Polymers from new photoredox catalyst system; Photopolymerization of acrylamide and its derivatives by light-sensitive metal salts; Some fundamental aspects of dye-sensitized photopolymerization; A basic study of novel photopolymerization systems; Surface-photopolymerization of vinyl and diene monomers; Photopolymerization initiators containing strong oxidizing agents. jg p.5
Descriptors : *PHOTOCHEMICAL REACTIONS, *POLYMERS, ULTRAVIOLET RADIATION, EXPOSURE(GENERAL), POLYMERIZATION, ACRYLIC RESINS, CHROMATES, LIGHT SOURCES, SURVEYS, OXIDIZERS, MONOMERS, CATALYSTS, DYES, ELECTROLYTES, OXIDATION REDUCTION REACTIONS, DIENES, SENSITIZING, POLYVINYL ALCOHOL, PHOTOPLASTIC MATERIALS, MICROSECOND TIME.
Subject Categories : Polymer Chemistry
Electricity and Magnetism
Distribution Statement : APPROVED FOR PUBLIC RELEASE