Accession Number : ADA302773

Title :   Defect Formation in Fused Silicas Due to Photon Irradiation at 5 and 50 EV.

Descriptive Note : Rept. for 1 Feb 87-31 Jan 91,

Corporate Author : VANDERBILT UNIV NASHVILLE TN

Personal Author(s) : Wang, P. W. ; Escher, G. ; Haglund, R. F., Jr. ; Kinser, D. L. ; Tolk, N. H.

PDF Url : ADA302773

Report Date : 31 JAN 1991

Pagination or Media Count : 6

Abstract : We have compared the paramagnetic defect formation in two types of pure fused silica glass irradiated with intense photon fluxes at 5 eV (KrF laser) and 50 eV (undulator beam from Aladdin Synchrotron Light Source), using electron paramagnetic resonance spectroscopy with a frequency of 9.7Hz and sample temperatures of 110 and 300K. The 5 eV photons produce approximately 10(exp -14) paramagnetic defects per photon and the 50 eV photons produce approximately 10(exp -5) defects per photon. The ratio of E' centers to oxygen related centers is approx. 10 times greater for 5 eV photons than for 50 eV photons in type III silica.

Descriptors :   *DEFECTS(MATERIALS), *FUSED SILICA, *PHOTONS, REPRINTS, RATIOS, INTENSITY, LASERS, OXYGEN, PURITY, LIGHT SOURCES, IRRADIATION, FLUORIDES, ELECTRON SPECTROSCOPY, ELECTRON PARAMAGNETIC RESONANCE, SILICA GLASS, KRYPTON, SYNCHROTRONS, PARAMAGNETISM.

Subject Categories : Geology, Geochemistry and Mineralogy
      Inorganic Chemistry
      Laminates and Composite Materials

Distribution Statement : APPROVED FOR PUBLIC RELEASE