Accession Number : ADA303537

Title :   High Temperature Superconducting Compounds.

Descriptive Note : Final technical rept.,

Corporate Author : MINNESOTA UNIV MINNEAPOLIS OFFICE OF RESEARCH AND TECHNOLOGY TRANSFER ADMINIS TRATION

Personal Author(s) : Goldman, Allen M.

PDF Url : ADA303537

Report Date : 28 DEC 1995

Pagination or Media Count : 25

Abstract : This program was concerned with films of high-T superconducting compounds with the objective of elucidating the underlying mechanism of the superconductivity as well as developing processes and structures of technological significance. The research was focused on the fabrication and characterization of films grown using Ozone assisted molecular beam epitaxy (MBE). The most significant development was the successful achievement of the so-called block-by-block deposition technique. In addition to superconducting films of high quality, we have grown nonsuperconducting oxides which exhibit the phenomenon which has been called colossal magnetoresistance (CMR), and insulating oxides which may be useful in preparing planar tunneling junctions. We have also carried out major study of the symmetry of the pairing state through an investigation of the transverse Meissner effect. Its result does not support d-wave pairing. Other accomplishments include characterization of the noise spectral density of superconducting films in a magnetic field, modeling of the electric field effect in high T films, studies of tunneling spectra using low temperature scanning tunneling microscopy, and the study of the penetration depth near the superconducting transition.

Descriptors :   *HIGH TEMPERATURE SUPERCONDUCTORS, MAGNETIC FIELDS, SCANNING ELECTRON MICROSCOPES, HIGH TEMPERATURE, TUNNELING(ELECTRONICS), THIN FILMS, ELECTRIC FIELDS, TRANSITION TEMPERATURE, PENETRATION, OXIDES, SYMMETRY, PLANAR STRUCTURES, SEMICONDUCTOR JUNCTIONS, SPECTRAL ENERGY DISTRIBUTION, MAGNETORESISTANCE, MOLECULAR BEAM EPITAXY.

Subject Categories : Electricity and Magnetism

Distribution Statement : APPROVED FOR PUBLIC RELEASE