Accession Number : ADA304063
Title : Application of X-ray Nanolithography to the Fabrication of Optoelectronic Integrated Circuits.
Descriptive Note : Final rept. 1 Jul 92-30 Jun 95,
Corporate Author : MASSACHUSETTS INST OF TECH CAMBRIDGE RESEARCH LAB OF ELECTRONICS
Personal Author(s) : Smith, Henry I.
PDF Url : ADA304063
Report Date : 08 NOV 1995
Pagination or Media Count : 9
Abstract : As a result of the research carried out under this grant, we have laid the foundation for an entirely new approach to high performance optoelectronic components for all optical networks utilizing wavelength division multiplexing We have developed both the required nanofabrication technology and the basic components. This work will be continued and expanded under DARPA sponsored MURI funding. New grating based components that promise even higher performance than those described here have recently been conceived, something that would not have occurred except for this grant. These more advanced components will be pursued under the MURI program which will commence in early 1996.
Descriptors : *ELECTROOPTICS, *LITHOGRAPHY, OPTICAL PROPERTIES, NETWORKS, INTEGRATED CIRCUITS, GRATINGS(SPECTRA), FREQUENCY DIVISION MULTIPLEXING, NANOTECHNOLOGY.
Subject Categories : Electrooptical and Optoelectronic Devices
Distribution Statement : APPROVED FOR PUBLIC RELEASE