Accession Number : ADA304103

Title :   Investigation of Electronic Structure Effects in Electromigration.

Descriptive Note : Technical rept.,

Corporate Author : ROME LAB GRIFFISS AFB NY

Personal Author(s) : Beasock, Joseph V.

PDF Url : ADA304103

Report Date : DEC 1995

Pagination or Media Count : 17

Abstract : The objective of this effort was to characterize the electronic structure of metal interconnects used in microelectronic devices for the purpose of better understanding electromigration in metals. Ideally, the approach would be to use available electron structure software to determine differences in total energy and density of states for the 'ideal' metal and the 'imperfect' metal. Changes in the electronic structure would then be associated with properties of the metal and compared with experimental systems reported in the literature. This technique would form a basis for evaluating proposed metal systems prior to actual fabrication. Software available from the academic community was evaluated for suitability in the calculation of the electronic structure of microcircuit metallization. Three representative quantum chemistry software packages are described: (1) MOPAC, (2) GEOMOS, and (3) EHMACC. The limitations of the software are discussed and a suitable alternative for modeling electromigration presented.

Descriptors :   *ELECTRON TRANSPORT, *MICROELECTRONICS, COMPUTER PROGRAMS, METALS, LIMITATIONS, SUBMINIATURE ELECTRONIC EQUIPMENT, QUANTUM ELECTRONICS, MICROCIRCUITS, IONIC CURRENT, METALLIZING, ISOTOPE SEPARATION.

Subject Categories : Electricity and Magnetism
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE