Accession Number : ADA305553
Title : Real-Time, Self-Directed MBE Flux Control Incorporating in Situ Ellipsometry. Phase 2.
Descriptive Note : Final rept. 1 Apr 93-30 Jun 95,
Corporate Author : TECHNOLOGY ASSESSMENT AND TRANSFER INC ANNAPOLIS MD
Personal Author(s) : Palaith, David
PDF Url : ADA305553
Report Date : DEC 1995
Pagination or Media Count : 125
Abstract : The purpose of this program was to develop a process control technology that would be generally applicable for advanced materials processing and to transfer that technology to end users in industry and government. The specific goal was to apply the control concepts to fabrication of electronic and optoelectronic devices by thin film deposition using molecular beam epitaxy (MBE). MBE was chosen because it is the favored technique and yet suffers from long deposition times and relatively high device rejection rates. The key results of this effort are detailed in this report. They include the development of a data logger, PID temperature control module with feed forward temperature compensation development, data logger and control module testing at the Materials Directorate and the Laboratory for Physical Sciences (LPS), along with future testing plans.
Descriptors : *PRODUCTION CONTROL, *ELLIPSOMETERS, *SOLID STATE CHEMISTRY, *MOLECULAR BEAM EPITAXY, HIGH RATE, ELECTROOPTICS, FLUX(RATE), THIN FILMS, TEST METHODS, FABRICATION, MODULES(ELECTRONICS), TEMPERATURE CONTROL, COMPUTER AIDED MANUFACTURING, CONTROL THEORY, REJECTION.
Subject Categories : Industrial Chemistry and Chemical Processing
Distribution Statement : APPROVED FOR PUBLIC RELEASE