Accession Number : ADA305881

Title :   Microlithographic Mask Development (MMD).

Descriptive Note : Summary rept.,

Corporate Author : LORAL FEDERAL SYSTEMS MANASSAS VA

PDF Url : ADA305881

Report Date : 20 MAR 1996

Pagination or Media Count : 66

Abstract : The contract period began with the establishment of manufacturing capability for prototype x ray mask builds by targeting both technical and manufacturing issues. By July of 1994, technical focus for x ray mask build was redefined, falling in line with optical lithography strategy. The Semiconductor Industry Association Lithography Roadmap recommended changing MMD emphasis to 0.25 and O.l8 microns generations rather than the original 0.35 and O.25 microns. Established goals were measured by following the progress of three product types: EXPO, NIGHTHAWK and TALON. The image size target for prototype masks started at O.25 microns for EXPO and progressed to 0.18 microns for NIGHTHAWK. TALON, a O.25 microns critical dimension (CD) test mask, provides a large process window for MMD learning. Engineering teams were charged with solving some major problems during the contract period.

Descriptors :   *X RAYS, *SOLID STATE ELECTRONICS, *PHOTOLITHOGRAPHY, OPTICAL PROPERTIES, MANUFACTURING, PROTOTYPES, SEMICONDUCTOR DEVICES, IMAGES, MONOLITHIC STRUCTURES(ELECTRONICS), MASKS, ELECTRONICS INDUSTRY.

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE