Accession Number : ADA306464

Title :   Chemical Vapor Deposited Permeation Barriers in Teflon Expulsion Bladders,

Corporate Author : DILECTRIX CORP FARMINGDALE NY

Personal Author(s) : Bazzarre, D. F. ; Petriello, John

PDF Url : ADA306464

Report Date : MAY 1968

Pagination or Media Count : 12

Abstract : This paper will primarily deal with the reduction of N(2)O(4) permeation in Teflon expulsion bladders, through the utilization of chemical vapor deposited aluminum coatings thicknesses from 0.0001 to 0.001 inches. The primary purpose of this work was to develop a high reliability process to incorporate continuous, conforming, aluminum permeation barriers within Teflon wall constructions. p1

Descriptors :   *PERMEABILITY, *CHEMICAL VAPOR DEPOSITION, *REDUCTION, *BARRIERS, *NITROGEN OXIDES, *TETRAFLUOROETHYLENE RESINS, *EXPULSION BLADDERS, REPRINTS, THICKNESS, ALUMINUM COATINGS, CONSTRUCTION, WALLS, UTILIZATION, HIGH RELIABILITY.

Subject Categories : Plastics
      Inorganic Chemistry
      Organic Chemistry
      Physical Chemistry
      Hydraulic and Pneumatic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE