Accession Number : ADA308274

Title :   Applications of Signal Processing, Fast Algorithms and Multivariable Control to Semiconductor Manufacturing.

Descriptive Note : Final rept. 1 Jan 93-31 Dec 95,

Corporate Author : STANFORD UNIV CA INFORMATION SYSTEMS LAB

Personal Author(s) : Kailath, Thomas

PDF Url : ADA308274

Report Date : 31 DEC 1995

Pagination or Media Count : 55

Abstract : The aim of this project was to demonstrate that a systems based methodology, utilizing the tools of fast algorithms, signal processing, and multivariable control, can make a significant difference to the efficient solution of various critical problems in the fields of semiconductor manufacturing and materials processing. Specifically, the following developments were achieved: (1) A robust multivariable control algorithm for use in several types of rapid thermal processes including oxidation, annealing, and silicidation as well as single-wafer chemical vapor deposition processes: (2) Introduction of novel signal processing techniques into a recently proposed acoustics based technique for noninvasive temperature measurement of RTP wafers; (3) Subspace based image processing strategies for defect inspection of periodic patterns in patterned wafers, distortion compensation for accurate overlay in lithography of quasiperiodic patterns, circle and ellipse fitting, and critical dimension measurement; and (4) Fast algorithms for the systematic design of phase-shifting masks.

Descriptors :   *ALGORITHMS, *SIGNAL PROCESSING, *MANUFACTURING, *MULTIVARIATE ANALYSIS, *SEMICONDUCTORS, THERMAL PROPERTIES, CONTROL, MEASUREMENT, METHODOLOGY, TEMPERATURE, ANNEALING, SIZES(DIMENSIONS), TOOLS, MATERIALS, PROCESSING, ACCURACY, EFFICIENCY, VAPOR DEPOSITION, LITHOGRAPHY, SOLUTIONS(GENERAL), OXIDATION, INSPECTION, PATTERNS, ACOUSTICS, COMPENSATION, DISTORTION, MASKS, PHASE SHIFT, ELLIPSES, FITTINGS, OVERLAYS.

Subject Categories : Electrical and Electronic Equipment
      Statistics and Probability
      Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE