Accession Number : ADA308418
Title : Focused Ion Beam Workstation Facility.
Descriptive Note : Final technical rept.,
Corporate Author : OREGON GRADUATE INST BEAVERTON DEPT OF MATERIALS SCIENCE AND ENGINEERING
Personal Author(s) : Wood, William B.
PDF Url : ADA308418
Report Date : FEB 1996
Pagination or Media Count : 5
Abstract : An FEl Company 610 series, Focussed Ion Beam (FIB) instrumentation facility has been installed. This ultrahigh resolution nanoscale technology system can remove/deposit material on submicron lateral and vertical scales, and allows precise lateral and vertical etch/deposition and cross sections of device features and structural defects that are either impossible of impractical by conventional cleaving or lapping techniques. Using gallium LMI technology, computer controlled positioning and ultrafine machining deposition, the FIB system can perform multiple cross sections on the same sample, expose subsurface nodes, form probe pads for electrical analysis, and prepare ultra precise samples for high resolution TEM/STEM. The research supported by this instrumentation concentrates on but is not limited to advanced electronic device manufacturing development. Additional, more general research areas include analysis of ceramic materials, titanium aluminide composites, ultra low temperature brazing alloy development, and molten metal-ceramic interactions.
Descriptors : *ION BEAMS, CONTROL, POSITION(LOCATION), MACHINING, COMPUTERS, STRUCTURAL PROPERTIES, MATERIALS, COMPOSITE MATERIALS, FACILITIES, HIGH RESOLUTION, ETCHING, ELECTRICAL PROPERTIES, NODES, CERAMIC MATERIALS, DEPOSITION, DEPOSITS, DEFECTS(MATERIALS), VERTICAL ORIENTATION, SCALE, POSITION FINDING, CROSS SECTIONS, PRECISION, SAMPLING, TITANIUM ALUMINIDE, INSTRUMENTATION, GALLIUM, SUBSURFACE, ULTRAFINES.
Subject Categories : Particle Accelerators
Distribution Statement : APPROVED FOR PUBLIC RELEASE