Accession Number : ADA308953
Title : Nanolithography of Semiconductor Structures Using Scanning Probe Microscopy.
Descriptive Note : Final rept. 1 Jul 92-30 Apr 94,
Corporate Author : ARIZONA UNIV TUCSON OPTICAL SCIENCES CENTER
Personal Author(s) : Sarid, Dror
PDF Url : ADA308953
Report Date : 1995
Pagination or Media Count : 3
Abstract : The work reported here consisted of the fabrication and characterization of Si nano- and micro-structures useful for electronic and optical applications. The fabrications were all done in an ultrahigh vacuum chamber (UHV), and the characterization was accomplished by using air and UHV scanning tunneling microscopy (STM), atomic force microscopy (AFM) infrared (IR) spectra, high resolution transmission electron microscopy (HRTEM), scanning electron microscopy (SEM) and optical microscopy.
Descriptors : *SCANNING, *PROBES, *STRUCTURES, *SEMICONDUCTORS, *MICROSCOPY, *LITHOGRAPHY, OPTICAL PROPERTIES, SCANNING ELECTRON MICROSCOPES, TUNNELING(ELECTRONICS), ELECTRONIC SCANNERS, VACUUM CHAMBERS, ELECTRON MICROSCOPY, OPTICAL ANALYSIS, ULTRAHIGH VACUUM.
Subject Categories : Electrical and Electronic Equipment
Printing and Graphic Arts
Atomic and Molecular Physics and Spectroscopy
Distribution Statement : APPROVED FOR PUBLIC RELEASE