Accession Number : ADA309326

Title :   High Vacuum Evaporation System.

Descriptive Note : Final rept. Jun 95-Mar 96,

Corporate Author : NORTHWESTERN UNIV EVANSTON IL

Personal Author(s) : Razeghi, Manijeh

PDF Url : ADA309326

Report Date : JUN 1996

Pagination or Media Count : 4

Abstract : The primary objective of the electron beam evaporator is to apply high quality optical coatings for lasers operating in the midinfrared region (2-5 micron) band, as well as lasers emitting in the range of 0.7 - 1.0 micron wavelength. The electron beam evaporator is used to compare the performance of midinfrared laser diodes with different schemes of optical coating on the laser facets. The use of optical coatings on lasers facets is to show the improvement in high power performance with HR (high reflective) + LR (low reflective) coating, and high temperature performance with HR coatings for the midinfrared lasers as well as lasers emitting in the range of 0.7 - 1.0 micron. It has become mandatory to use high quality optical coatings for further improving the performance of 3.2 um InAsSb/InAs lasers. Three schemes of facet coatings are studied: LR coating on front, HR on back, and asymetric coating of LR/HR. The ebeam system is also used for the application of Sb-based infrared photodetectors.

Descriptors :   *INFRARED LASERS, *OPTICAL COATINGS, SEMICONDUCTOR LASERS, VACUUM CHAMBERS, ELECTRON BEAMS, INFRARED OPTICAL MATERIALS, EVAPORATORS, HIGH VACUUM.

Subject Categories : Lasers and Masers

Distribution Statement : APPROVED FOR PUBLIC RELEASE