Accession Number : ADA309357
Title : Preparation and Characterization of Arsine Derivatives: X-Ray Crystal Structures of As(Si(t)BuMe2)3, As(SiMe3)2,(SiPh3), Et3Ga.As(SiMe3)2(SiPh3), and As(SePh)3.
Descriptive Note : Technical rept.,
Corporate Author : DUKE UNIV DURHAM NC DEPT OF CHEMISTRY
Personal Author(s) : Baldwin, Ryan A. ; Rahbarnoohi, Hamid ; Jones, Leonidas J., III. ; McPhail, Andrew T. ; Wells, Richard L.
PDF Url : ADA309357
Report Date : MAY 1996
Pagination or Media Count : 30
Abstract : For the last decade, our laboratory has had great interest in the chemistry of silylarsines 1. These compounds, in combination with Group 13 alkyl or halogen derivatives, have been shown to be excellent starting reagents for preparing compounds which contain the Group 13 element-arsenic bond. Although the reactivity of silylarsines is well documented (vide supra), structural characterization data for these species has been limited to solution- and gas-phase measurements 2 due to their non-crystallinity. As a result, unambiguous structural information for these compounds is scant and appears to be limited to lithium-arsenide salts coordinated to donor solvents 3. Therefore, we became interested in preparing organosilylarsines which could find utility in our ongoing investigations of Group 13 element-arsenic compounds and be characterized in the solid-state. In addition to this chemistry, we wished to study systems which focused on the reactions of organosilylarsines with Group 13 and Group 16 derivatives. Through our efforts, we have been able to observe some interesting chemical phenomena and isolate several new compounds (this work). p4
Descriptors : *CRYSTAL STRUCTURE, *X RAYS, *ARSINES, *ARSENIC, REPRINTS, SOLUTIONS(MIXTURES), METHYL RADICALS, STRUCTURAL PROPERTIES, REACTIVITIES, LITHIUM, CHEMICAL BONDS, CHEMISTRY, SILICON, CHEMICAL REACTIONS, BUTYL RADICALS, GALLIUM, SOLVENTS, PHENYL RADICALS, SOLID STATE CHEMISTRY, ETHYL RADICALS, HALOGENS, ALKYL RADICALS, SELENIUM.
Subject Categories : Inorganic Chemistry
Atomic and Molecular Physics and Spectroscopy
Distribution Statement : APPROVED FOR PUBLIC RELEASE